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Nikon and SUNY’s Partnership Leads to $350 Million Investment At Nanocollege In Albany, New York

Area Development Online News Desk (07/02/2013)
Nikon Corporation, a world leader in photography, digital imaging technology and computer chip development, partnered with State University of New York’s College of Nanoscale Science and Engineering in a $350 million investment to develop the first of its kind, next generation, lithography technology on 450mm wafer and create 100 high-tech jobs.

Nikon joins the Global Consortium of companies working at Nanocollege that is driving the multi-billion dollar international industry transition from the current 300mm wafer platform to the next generation 450mm wafer platform, Gov Andrew Cuomo’s Office said.

“I am pleased to welcome world renowned corporation Nikon to the Global Consortium at the College of Nanoscale Science and Engineering here in Albany,” Governor Cuomo said. “This new partnership is further proof that New York is the leader in innovation and research in the nanotechnology field as this important industry continues to evolve. The technologies being developed at CNSE in collaboration with these corporations will allow our state to compete for the high-tech jobs of the future, attract new investments, and grow the state’s economy.”

“Nikon is honored to become an Associate Member of G450C, which leads the worldwide industry transition to 450mm,” said Kazuo Ushida, Nikon Corporation Executive Vice President and Precision Equipment Company President. “G450C has been implementing unprecedented and ambitious programs to help lead the critical industry transition to the 450mm wafer platform as smoothly as possible under the leadership of Governor Cuomo. The closure of this contract with G450C validates the consortium’s confidence in Nikon’s development program for 450mm systems, and we are proud of it. We will continue our effort aggressively to meet its expectations.”

Nikon will locate scientists, researchers, and engineers at CNSE’s Albany NanoTech Complex, and provide advanced lithography scanner tooling and wafer patterning services, to support and accelerate the development of 450mm wafer technology. In particular, Nikon has a comprehensive 450mm lithography scanner development program that can help G450C to meet its early patterning requirements.

Through the public-private partnership between Nikon and CNSE, Nikon will become an Associate Member of G450C, headquartered at CNSE. Total funding of $350 million over 5 years for tooling, set up, operation, support and maintenance is being funded by multiple private sources, including Nikon. The program will be supported by more than 100 high-tech jobs from Nikon, CNSE, and their industrial partners.

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